Properties of NbTiN thin films prepared by reactive DC magnetron sputtering

IEEE Transactions on Applied Superconductivity

Volumn 11, Issue 1 III, 2001, Pages 3828-3831

  Myoren, H ^a   Shimizu, T ^a   Iizuka, T ^a   Takada, S ^a  

^a SAITAMA UNIVERSITY   (Japan)

Author keywords

Epitaxial template layer; Film orientation; Nb1 x TixN; Surface morphology

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; EPITAXIAL GROWTH; FILM PREPARATION; LATTICE CONSTANTS; MAGNETRON SPUTTERING; MORPHOLOGY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SUPERCONDUCTING FILMS; SUPERCONDUCTIVITY; SURFACE STRUCTURE; X RAY DIFFRACTION ANALYSIS;

EPITAXIAL TEMPLATE LAYER; MOLE FRACTION; NIOBIUM TITANIUM NITRIDE THIN FILMS; REACTIVE DC MAGNETRON SPUTTERING;

NIOBIUM COMPOUNDS;

EID: 0035268429     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/77.919899     Document Type: Conference Paper

References (8)

1. Properties of niobium-titanium nitride superconducting thin films
2. Niobium-titanium nitride thin films for superconducting RF accelerator cavities
3. Recommended directions of research and development in superconducting electronics
4. Fabrication and dc-characterization of NbTiN based SIS mixers for use between 600 and 1200 GHz
5. Low-loss NbTiN films for THz SIS mixer tuning circuits
6. NbN/AlN/NbN tunnel junctions fabricated at ambient substrate temperature
7. Superconducting properties and crystal structures of single-crystal niobium nitride thin films deposited at ambient substrate temperature
8. Optimization of RF- and DC-sputtered NbTiN films for integration with Nb-based SIS junctions