Some experiments on the scratching of silicon: In situ scratching inside an SEM and scratching under high external hydrostatic pressures

International Journal of Mechanical Sciences

Volumn 43, Issue 2, 2001, Pages 335-347

  Yoshino, M ^a   Aoki, T ^a   Shirakashi, T ^b   Komanduri, R ^c  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b TOKYO DENKI UNIVERSITY   (Japan)

^c Oklahoma State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BRITTLENESS; COMPUTER SIMULATION; DEFORMATION; DUCTILITY; FINITE ELEMENT METHOD; FRACTURE MECHANICS; HYDROSTATIC PRESSURE; SCANNING ELECTRON MICROSCOPY;

MESO-PLASTICITY SIMULATIONS;

SEMICONDUCTING SILICON;

EID: 0035255567     PISSN: 00207403     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0020-7403(00)00019-9     Document Type: Article

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