Stability of a-Si:H prepared by hot-wire and glow discharge using H2 dilution evaluated by pulsed laser degradation

Journal of Non-Crystalline Solids

Volumn 227-230, Issue PART 1, 1998, Pages 287-291

  Hof, Ch ^a   Ziegler, Y ^a   Platz, R ^a   Wyrsch, N ^a   Shah, A ^a  

^a UNIVERSITY OF NEUCHÂTEL   (Switzerland)

Author keywords

Amorphous silicon; Glow discharge; Hot wire; Pulsed laser degradation

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; DEGRADATION; DEPOSITION; DYE LASERS; ELECTRON TRANSPORT PROPERTIES; GLOW DISCHARGES; LIGHT ABSORPTION; PHOTOCONDUCTIVITY; PULSED LASER APPLICATIONS; SEMICONDUCTING SILICON; SILICON SOLAR CELLS;

HOT WIRE DEPOSITION; LIGHT SOAKING; PULSED LASER DEGRADATION;

SEMICONDUCTING FILMS;

EID: 0032068761     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00066-0     Document Type: Article

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