Production of focused electron beams in a plasma implantation system

Surface and Coatings Technology

Volumn 136, Issue 1-3, 2001, Pages 40-42

  Adler, R J ^a   Richter Sand, R J ^a   Abercrombie, J ^a  

^a Ionatron   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; AMORPHOUS MATERIALS; ELECTRON BEAMS; ELECTRON IRRADIATION; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; PLASTICS;

PLASMA EXTRACTED ELECTRONS;

PLASMA SOURCES;

EID: 0035254330     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)01007-0     Document Type: Article

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7. N. Taniguchi, Energy Beam Processing of Materials, Clarendon Press, Oxford, (1989) (See for example).