Conformal ion implantation using pulsed plasma sources

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 2, 1999, Pages 883-887

  Adier, R J ^a  

^a Ionatron   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22644448514     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)

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6. See, for example, S. Humphries, Jr., Charged Particle Beams (Wiley, New York, 1990), p. 200.
7. J. T. Scheuer et al., Surf. Coat. Technol. 93, 192 (1997).
8. M. Tuszewski et al., Surf. Coat. Technol. 93, 203 (1997).
9. M. Shamim, J. T. Scheuer, and J. R. Conrad, J. Appl. Phys. 69, 2904 (1991).
10. M. M. Shamim et al., J. Appl. Phys. 70 (1991).