Shunting arc as a pulsed ion source for solid-state materials for plasma-based ion implantation

Surface and Coatings Technology

Volumn 136, Issue 1-3, 2001, Pages 55-59

  Yukimura, K ^a   Yoshioka, K ^a   Tani, Y ^a   Masamune, S ^b  

^a DOSHISHA UNIVERSITY   (Japan)

^b KYOTO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; IGNITION; ION IMPLANTATION; ION SOURCES;

PLASMA-BASED ION IMPLANTATION (PBII); SHUNTING ARC;

PLASMA SOURCES;

EID: 0035254046     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)01011-2     Document Type: Article

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