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Volumn 10, Issue 2, 2001, Pages 132-138
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Metal-containing amorphous carbon film development using electron cyclotron resonance CVD
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Author keywords
CVD; DLC; Electrical; Optical
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Indexed keywords
ARGON;
CARBON;
CHEMICAL VAPOR DEPOSITION;
ELECTRIC CONDUCTIVITY OF SOLIDS;
ELECTRIC POTENTIAL;
ELECTRON CYCLOTRON RESONANCE;
FILM GROWTH;
HARDNESS;
LIGHT ABSORPTION;
METHANE;
RAMAN SCATTERING;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SPUTTER DEPOSITION;
THIN FILMS;
X RAY DIFFRACTION ANALYSIS;
ELECTRON CYCLOTRON RESONANCE CHEMICAL VAPOR DEPOSITION;
AMORPHOUS FILMS;
VAPOR DEPOSITION;
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EID: 0035248214
PISSN: 09259635
EISSN: None
Source Type: Journal
DOI: 10.1016/S0925-9635(00)00459-3 Document Type: Article |
Times cited : (19)
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References (16)
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