Metal-containing amorphous carbon film development using electron cyclotron resonance CVD

Diamond and Related Materials

Volumn 10, Issue 2, 2001, Pages 132-138

  Rusli, H ^a   Yoon, S F ^a   Huang, Q F ^a   Ahn, J ^a   Zhang, Q ^a   Yang, H ^a   Wu, Y S ^a   Teo, E J ^b   Osipowicz, T ^b   Watt, F ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

CVD; DLC; Electrical; Optical

Indexed keywords

ARGON; CARBON; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC POTENTIAL; ELECTRON CYCLOTRON RESONANCE; FILM GROWTH; HARDNESS; LIGHT ABSORPTION; METHANE; RAMAN SCATTERING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTER DEPOSITION; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ELECTRON CYCLOTRON RESONANCE CHEMICAL VAPOR DEPOSITION;

AMORPHOUS FILMS;

VAPOR DEPOSITION;

EID: 0035248214     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00459-3     Document Type: Article

References (16)