Characterization of the slot antenna microwave plasma source

IEEE Transactions on Plasma Science

Volumn 29, Issue 1, 2001, Pages 13-18

  Wu, Cong Feng ^a   Zhan, Ru Juan ^a   Wen, Xiao Hui ^a   Huang, Wei Dong ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

Characterization; Electromagnetic field uniformity; Homogeneous plasma; Plasma density; Surface wave mode

Indexed keywords

ARGON; ELECTROMAGNETIC FIELDS; PLASMA DENSITY; SLOT ANTENNAS; SURFACE WAVES;

MICROWAVE PLASMA; OPTICAL EMISSIONS; PLASMA CYLINDER; PLASMA PARAMETER;

PLASMA SOURCES;

EID: 0035246062     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.912936     Document Type: Article

References (7)

1. Plasma source based on the propagation of electromagnetic surface wave
2. Characterization of a slot antenna microwave plasma sources for hydrogen plasma cleaning
3. Influence of the substrate surface on ion concentrations in a large volume microwave plasma
4. Large diameter plasma generation using a waveguide-based field applicator at 2.45 GHz
5. Production of uniform plasma with surface electromagnetic wave launched by a waveguide-surfatron
6. Axial electron density and wave power distribution along a plasma column sustained by the propagation of a surface microwave