Influence of the substrate surface on ion concentrations in a large volume microwave plasma

Surface and Coatings Technology

Volumn 97, Issue 1-3, 1997, Pages 122-130

  Korzec, D ^a   Seibert, Ch ^a   Winter, R ^a   Engemann, J ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

Ion concentration distribution; Large area substrates; Microwave discharge; Plasma density

Indexed keywords

CARRIER CONCENTRATION; MICROWAVE ANTENNAS; PLASMA DENSITY; PRESSURE EFFECTS; SLOT ANTENNAS; SUBSTRATES; TEMPERATURE DISTRIBUTION;

ION CONCENTRATION DISTRIBUTION; MICROWAVE DISCHARGES; SLOT ANTENNA MICROWAVE PLASMA;

PLASMA SOURCES;

EID: 0031368867     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00406-4     Document Type: Article

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