The effect of the deposition method on the optical properties of SiO2 thin films

Journal of Materials Science: Materials in Electronics

Volumn 12, Issue 2, 2001, Pages 107-109

  Khodier, S A ^a   Sidki, H M ^a  

^a NATIONAL INSTITUTE FOR STANDARDS   (Egypt)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON BEAMS; ELLIPSOMETRY; EVAPORATION; REFRACTIVE INDEX; SEMICONDUCTING SILICON COMPOUNDS; SPUTTERING;

ABSORPTION CONSTANT; ELECTRON BEAM EVAPORATION; ELECTRON BEAM GUN DEPOSITION; OPTICAL CONSTANTS; ROTATING POLARIZER SPECTROSCOPIC ELLIPSOMETER;

THIN FILMS;

EID: 0035244657     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1011254220935     Document Type: Article

References (12)

1. Ellipsometry and polarized light