Effects of conventional and high-intensity light-curing on enamel shear bond strength of composite resin and resin-modified glass-ionomer

American Journal of Orthodontics and Dentofacial Orthopedics

Volumn 119, Issue 1, 2001, Pages 30-35

  Sfondrini, Maria Francesca ^a   Cacciafesta, Vittorio ^a   Pistorio, Angela ^b   Sfondrini, Giuseppe ^a,c  

^a UNIVERSITY OF PAVIA   (Italy)

^b Clin Epidemiology and Biometry Unit   (Italy)

^c Clin Epidemiology and Biometry Unit ^*  (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLIC ACID RESIN; ADHESIVE AGENT; ALUMINUM SILICATE; BISPHENOL A BIS(2 HYDROXYPROPYL) ETHER DIMETHACRYLATE; CARBOPOL 940; FUJI ORTHO LC; GLASS IONOMER; PHOSPHORIC ACID; RESIN; RESIN CEMENT; TRANSBOND; XENON;

ANALYSIS OF VARIANCE; ANIMAL; ARTICLE; CATTLE; CHEMISTRY; CHI SQUARE DISTRIBUTION; COMPARATIVE STUDY; DENTAL ACID ETCHING; DENTAL BONDING; DENTAL CARE; ENAMEL; INCISOR; INSTRUMENTATION; LIGHT; MECHANICAL STRESS; METHODOLOGY; ORTHODONTIC DEVICE; RADIATION EXPOSURE; RANDOMIZATION; SURFACE PROPERTY; TIME; ULTRASTRUCTURE;

ACID ETCHING, DENTAL; ACRYLIC RESINS; ADHESIVES; ALUMINUM SILICATES; ANALYSIS OF VARIANCE; ANIMALS; BISPHENOL A-GLYCIDYL METHACRYLATE; CATTLE; CHI-SQUARE DISTRIBUTION; COMPOSITE RESINS; DENTAL BONDING; DENTAL ENAMEL; DENTAL STRESS ANALYSIS; GLASS IONOMER CEMENTS; INCISOR; LIGHT; ORTHODONTIC BRACKETS; PHOSPHORIC ACIDS; RANDOM ALLOCATION; RESIN CEMENTS; STRESS, MECHANICAL; SURFACE PROPERTIES; TIME FACTORS; XENON;

EID: 0035229436     PISSN: 08895406     EISSN: None     Source Type: Journal    
DOI: 10.1067/mod.2001.111399     Document Type: Article

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