Optimum location of the evaporation source: Experimental verification

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 2001, Pages 306-313

  Stevenson, I C ^a   Sadkhin, G ^a   Vacuum, D ^a  

^a Denton Vacuum Inc   (United States)

Author keywords

Anti reflection (AR); Optical coatings; Source control; Thickness uniformity

Indexed keywords

DEPOSITION; ELECTRON BEAMS; EVAPORATION; MASKS; SUBSTRATES; THICKNESS CONTROL;

SOURCE CONTROL;

ANTIREFLECTION COATINGS;

EID: 0035208770     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)

1. Optimizing source location for control of thickness uniformity
2. Thickness distribution of evaporated films