2 μm thin film c-Si cells on near-Lambertian Al2O3 substrates

Solar Energy Materials and Solar Cells

Volumn 65, Issue 1, 2001, Pages 593-598

  Shimokawa, Ryuichi ^a   Takahashi, Tetsuo ^a   Takato, Hidetaka ^a   Ozaki, Atsushi ^b   Takano, Yukio ^b  

^a ELECTROTECHNICAL LABORATORY   (Japan)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; COMPUTATIONAL METHODS; CRYSTALLIZATION; DIFFUSION IN SOLIDS; PHOSPHORUS; PHOTOCURRENTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFLECTION; SHORT CIRCUIT CURRENTS; SUBSTRATES; THIN FILM DEVICES;

DOCTOR BLADE TECHNIQUE; ELECTRON BEAM RECRYSTALLIZATION; NEAR LAMBERTIAN ALUMINA SUBSTRATES; OPTICAL CONFINEMENT; OPTICAL DIFFUSIVITY; THIN FILM SILICON CELLS;

SILICON SOLAR CELLS;

EID: 0035198764     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(00)00146-X     Document Type: Article

References (8)

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