Recrystallization of polycrystalline silicon films on ceramics by electron beam

Solar Energy Materials and Solar Cells

Volumn 48, Issue 1-4, 1997, Pages 327-333

  Takahashi, Tetsuo ^a   Shimokawa, Ryuichi ^a   Matsumoto, Yasuhiro ^a,b   Ishii, Kenichi ^a   Sekigawa, Toshihiro ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

^b DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

Electron beam; Polycrystalline silicon films; Recrystallization

Indexed keywords

ALUMINA; CERAMIC MATERIALS; CHEMICAL VAPOR DEPOSITION; CRYSTAL IMPURITIES; CRYSTAL STRUCTURE; CRYSTALLIZATION; ELECTRON BEAMS; ELECTRON CYCLOTRON RESONANCE; POLYCRYSTALLINE MATERIALS; SILICON NITRIDE; THIN FILMS;

ELECTRON BEAM RECRYSTALLIZATION TECHNIQUE; THERMAL BUFFERS;

SILICON SOLAR CELLS;

EID: 0031273628     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(97)00144-X     Document Type: Article

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