EUV mask fabrication using Be-based multi-layer mirrors

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 814-818

  Mangat, Pawitter ^a   Wasson, James ^a   Hector, Scott ^a   Cardinale, Greg ^a   Bajt, Sasa ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BANDWIDTH; BERYLLIUM; LIGHT ABSORPTION; LIGHT REFLECTION; MASKS; METALLIC FILMS; MIRRORS; MOLYBDENUM; OPTICAL MULTILAYERS; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0033699509     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (16)