Study for cross contamination between CMOS image sensor and IC product

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue 2, 2001, Pages 121-123

  Chen, C H ^a   Tsai, H J ^a   Huang, K S ^a   Liu, H T ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

CIS; Color filter; Cross contamination; Heavy metal; TXRF

Indexed keywords

CMOS INTEGRATED CIRCUITS; CONTAMINATION; IMPURITIES; PHOTORESISTORS; RELIABILITY;

CROSS CONTAMINATION;

IMAGE SENSORS;

EID: 0035176387     PISSN: 1523553X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)