Ultra-thin film fully-depleted SOI CMOS with raised G/S/D device architecture for sub-100 nm applications

IEEE International SOI Conference

Volumn , Issue , 2001, Pages 45-46

  Van Meer, H ^a   De Meyer, K ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; MASKS; PHASE SHIFT; SCANNING ELECTRON MICROSCOPY; SILICON ON INSULATOR TECHNOLOGY; ULTRATHIN FILMS;

EPITAXIAL SILICON;

CMOS INTEGRATED CIRCUITS;

EID: 0035172590     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)