New chemical removing and air cooling technology for clean room recirculation air using chilled pure water showering method

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue , 2001, Pages 485-488

  Wakamatsu, H ^a   Matsuki, M ^a   Tanaka, N ^a   Iwanaga, Y ^a   Murata, K ^a  

^a OKI ELECTRIC INDUSTRY CO   (Japan)

Author keywords

Air cooling capacity; Chemical cleanliness; Chemical contaminant; Chilled pure water; Conductivity; Gas liquid contact; Removal efficiency; Water solubility

Indexed keywords

CLEAN ROOMS; CONTAMINATION; COOLING SYSTEMS; COOLING WATER; PHOTOLITHOGRAPHY; POSITIVE IONS;

AIR COOLING TECHNOLOGY; CHEMICAL CONTAMINATION;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0035165734     PISSN: 1523553X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (1)

1. High efficiency airborne molecular contaminants removal technology by a new cooled-type 2-stage high-speed air washer method