High efficiency airborne molecular contaminants removal technology by a new cooled-type 2-stage high-speed air washer method

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue 1, 2000, Pages 289-292

  Wakamatsu, Hidetoshi ^a   Matsuki, Mikio ^a   Tanaka, Norio ^a   Ogata, Hiroshi ^a   Iba, Hiroo ^a   Murata, Koichi ^a  

^a OKI ELECTRIC INDUSTRY CO   (Japan)

Author keywords

Air washer; B factor; Chemical contaminants; Chemical ion equivalent; Ion balance

Indexed keywords

AIR CONDITIONING; AIR POLLUTION CONTROL; CONCENTRATION (PROCESS); ENVIRONMENTAL IMPACT; IMPURITIES; SOLUBILITY;

AIR WASHERS; AIRBORNE MOLECULAR CONTAMINANTS (AMC);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0034583772     PISSN: 1523553X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)

1. Removal of chemical compounds from outside air by air washer (part 4)
2. Effectiveness of hydrophilic eliminator installed in air washer