Wafer Ambient Control for Agile FAB

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue , 2001, Pages 121-124

  Ito, Shoko ^a   Tamaoki, Makiko ^a   Shimazaki, Ayako ^a   Nadahara, Soichi ^a   Okumura, Katsuya ^a   Suzuki, Yoko ^b   Tanaka, Akira ^b   Tsujimura, Manabu ^b  

^a TOSHIBA CORPORATION   (Japan)

^b EBARA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CORROSION PROTECTION; CRYSTAL DEFECTS; LARGE SCALE SYSTEMS; POLYSILICON; VAPOR DEPOSITION;

WAFER AMBIENT CONTROL BOX;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0035163165     PISSN: 1523553X     EISSN: None     Source Type: Journal    
DOI: 10.1109/ISSM.2001.962929     Document Type: Article

References (4)