Surface properties of Hafnium diboride(0 0 0 1) as determined by X-ray photoelectron spectroscopy and scanning tunneling microscopy

Surface Science

Volumn 470, Issue 3, 2001, Pages 215-225

  Perkins, C L ^a   Singh, R ^a   Trenary, M ^a   Tanaka, T ^b   Paderno, Yu ^c  

^a UNIVERSITY OF ILLINOIS AT CHICAGO   (United States)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^c FRANTSEVICH INSTITUTE FOR PROBLEMS OF MATERIALS SCIENCE   (Ukraine)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL ORIENTATION; LOW ENERGY ELECTRON DIFFRACTION; MORPHOLOGY; SCANNING TUNNELING MICROSCOPY; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

HAFNIUM DIBORIDE; LOW INDEX CRYSTAL SURFACES;

HAFNIUM COMPOUNDS;

EID: 0035128949     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(00)00862-1     Document Type: Article

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