Pulsed-laser deposition of Si nanoclusters

Applied Surface Science

Volumn 127-129, Issue , 1998, Pages 378-382

  Vijayalakshmi, S ^a   George, M A ^b   Sturmann, J ^c   Grebel, H ^a  

^a NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

^b UNIVERSITY OF ALABAMA IN HUNTSVILLE   (United States)

^c VANDERBILT UNIVERSITY   (United States)

Author keywords

Nonlinear optical properties; Pulsed laser deposition; Si nanoclusters

Indexed keywords

ABSORPTION SPECTROSCOPY; ATOMIC FORCE MICROSCOPY; DEPOSITION; FILM GROWTH; FREE ELECTRON LASERS; NONLINEAR OPTICS; PULSED LASER APPLICATIONS; SILICON WAFERS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

PULSED LASER DEPOSITION (PLD);

SEMICONDUCTING FILMS;

EID: 0032070247     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)00659-4     Document Type: Article

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