Electrical conduction studies of plasma enhanced chemical vapor deposited silicon nitride films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 19, Issue 1, 2001, Pages 41-44

  Basa, D K ^a  

^a UTKAL UNIVERSITY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; DECOMPOSITION; ELECTRIC CONDUCTIVITY; ELECTRIC FIELD EFFECTS; FILMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILANES; STOICHIOMETRY;

CURRENT CONDUCTION MECHANISM; FOWLER-NORDHEIM CONDUCTION; POOLE-FRENKEL CONDUCTION;

SILICON NITRIDE;

EID: 0035108572     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1322642     Document Type: Article

References (2)

1. S. Uchikoga, M. Kakinoki, M. Nakajima, and S. Suzuki, J. Appl. Phys. 76, 2484 (1994).
2. F. Demichelis, G. Crovini, F. Giorgis, C. F. Pirri, and E. Tresso, J. Appl. Phys. 79, 1730 (1996).