Masking and purging mutations following EMS treatment in haploid, diploid and tetraploid yeast (Saccharomyces cerevisiae)

Genetical Research

Volumn 77, Issue 1, 2001, Pages 9-26

  Mable, Barbara K ^a,b   Otto, Sarah P ^a  

^a UNIVERSITY OF BRITISH COLUMBIA   (Canada)

^b UNIVERSITY OF GUELPH   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ALKYLATING AGENT; ETHANE METHYLSULPHONATE; MUTAGENIC AGENT; SULFONIC ACID DERIVATIVE; UNCLASSIFIED DRUG;

ARTICLE; AUXOTROPHIC MUTANT; CELL STRAIN; CELL VOLUME; CONTROLLED STUDY; DIPLOIDY; DNA DAMAGE; GENE LOCUS; GENE MUTATION; GROWTH RATE; HAPLOIDY; MASKING; MEASUREMENT; MUTAGENESIS; NONHUMAN; REPRODUCTION; SACCHAROMYCES CEREVISIAE; TETRAPLOIDY; YEAST;

CELL DIVISION; CELL SEPARATION; CHROMOSOME DELETION; DNA; DNA DAMAGE; DOSE-RESPONSE RELATIONSHIP, DRUG; ETHYL METHANESULFONATE; EVOLUTION, MOLECULAR; FLOW CYTOMETRY; GENE DELETION; GENES, FUNGAL; GENES, MATING TYPE, FUNGAL; GENOTYPE; MODELS, STATISTICAL; MODELS, THEORETICAL; MUTAGENESIS; MUTAGENS; MUTATION; PEPTIDES; PLOIDIES; SACCHAROMYCES CEREVISIAE; TIME FACTORS;

SACCHAROMYCES CEREVISIAE;

EID: 0035103768     PISSN: 00166723     EISSN: None     Source Type: Journal    
DOI: 10.1017/S0016672300004821     Document Type: Article

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