Effect of back contact on field emission from carbon films deposited by very high frequency chemical vapor deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 1, 2001, Pages 39-41

  Kosarev, A I ^a   Andronov, A N ^b   Vinogradov, A J ^a   Felter, T E ^c   Titkov, A N ^a   Makarenko, I V ^a   Vaqar, M Z ^a   Robozerov, S V ^b   Shutov, M V ^a  

^a IOFFE INSTITUTE   (Russian Federation)

^b PETER THE GREAT ST PETERSBURG POLYTECHNIC UNIVERSITY   (Russian Federation)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COATING TECHNIQUES; CRYSTAL MICROSTRUCTURE; ELECTRON ENERGY LOSS SPECTROSCOPY; FIELD EMISSION CATHODES; FILM GROWTH; LIQUID CRYSTAL DISPLAYS; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; THIN FILMS;

CARBON FILMS;

CARBON FIBERS;

EID: 0035078372     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1340010     Document Type: Article

References (7)

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7. A. I. Kosarev, A. S. Abramov, A. N. Andronov, A. J. Vinogradov, M. V. Shutov, M. Z. Waqar, A. N. Titkov, and I. V. Makarenko, Proceedings of the 4th International Symposium on Diamond Films and Related Materials, Kharkov, 20-22 September 1999, p. 209.