Field emission from amorphous carbon and silicon-carbon films, prepared by VHF CVD

Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC

Volumn , Issue , 1998, Pages 265-266

  Kosarev, A I ^a   Andronov, A N ^a   Robozerov, S V ^a   Felter, T E ^a   Vinogradov, A J ^a   Zhirnov, V V ^a   Shutov, M V ^a  

^a Department of General Physics Technological Institute   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; CARBON; CERAMIC MATERIALS; CHEMICAL VAPOR DEPOSITION; ELECTRON EMISSION; METHANE; QUARTZ; SCANNING ELECTRON MICROSCOPY; SECONDARY EMISSION; SILICON;

AMORPHOUS CARBON FILMS; SCANNING SECONDARY ELECTRON EMISSION MICROSCOPY (SSEEM); SILICON CARBON FILMS;

AMORPHOUS FILMS;

EID: 0032315364     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (0)