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Volumn 48, Issue 2-3, 2001, Pages 71-78

Marangoni flow of molten silicon

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; FLOW VISUALIZATION; HEAT TRANSFER; LIQUID METALS; MASS TRANSFER; OSCILLATIONS; OXYGEN; PARTIAL PRESSURE; PHASE INTERFACES; TEMPERATURE MEASUREMENT; THERMOCOUPLES; X RAY RADIOGRAPHY;

EID: 0035059337     PISSN: 00945765     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0094-5765(00)00142-9     Document Type: Article
Times cited : (9)

References (28)
  • 4
    • 0002998828 scopus 로고    scopus 로고
    • ed. C. L. Claeys, P. Rai-Choudhury, M. Watanabe, P. Stallhofer and H. J. Dawson, The Electrochemical Society, Pennington, NJ
    • Togawa, S., Nishi, Y. and Kobayashi, M., High Purity Silicon V, ed. C. L. Claeys, P. Rai-Choudhury, M. Watanabe, P. Stallhofer and H. J. Dawson, The Electrochemical Society, Pennington, NJ, 1998, vol. 98-13, pp. 67-78.
    • (1998) High Purity Silicon v , vol.98 , Issue.13 , pp. 67-78
    • Togawa, S.1    Nishi, Y.2    Kobayashi, M.3
  • 24
    • 0003347212 scopus 로고
    • ed. H. R. Huff, R. J. Krieger and Y. Takeishi. The Electrochemical Society, Pennington, NJ
    • Hoshikawa, K., Hirata, H., Nakanishi, H. and Ikuta, K., Semiconductor Silicon, ed. H. R. Huff, R. J. Krieger and Y. Takeishi. The Electrochemical Society, Pennington, NJ, 1981, p. 101.
    • (1981) Semiconductor Silicon , pp. 101
    • Hoshikawa, K.1    Hirata, H.2    Nakanishi, H.3    Ikuta, K.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.