Hard x-ray multilayers: A study of different material systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4145, Issue , 2001, Pages 72-79

  Ivan, A ^a,b   Bruni, R J ^a   Byun, K ^a,c   Gorenstein, P ^a   Romaine, S E ^a  

^a HARVARD SMITHSONIAN CENTER FOR ASTROPHYSICS   (United States)

^b Massachusetts Institute of Technology Cambridge   (United States)

^c HARVARD UNIVERSITY   (United States)

Author keywords

Graded multilayers; Sputtering deposition; X ray optics; X ray reflectivity

Indexed keywords

ATOMIC FORCE MICROSCOPY; MAGNETRON SPUTTERING; OPTICAL MULTILAYERS; PRESSURE; REFLECTION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; SILICON WAFERS; TRANSMISSION ELECTRON MICROSCOPY;

GRADED MULTILAYERS; LOW ARGON PRESSURES; STYLUS PROFILOMETRY; X RAY REFLECTIVITY;

X RAY OPTICS;

EID: 0035054332     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.411622     Document Type: Article

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