Chrome dry etch process characterization using surface nano profiling

Proceedings of SPIE- The International Society for Optical Engineering

Volumn 4186, Issue , 2001, Pages 97-107

  Ruhl, G ^a   Dietrich, R ^a   Ludwig, R ^a   Falk, N ^a   Morrison, T ^a   Stoehr, B ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

CD etch bias; CD measurement; Chrome dry etch; Surface nano profiling

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHROMATES; DRY ETCHING; OPTICAL MICROSCOPY; PROFILOMETRY; SCANNING ELECTRON MICROSCOPY; SURFACE STRUCTURE;

OPTICAL PROXIMITY CORRECTION (OPC); SCANNING NANO PROFILERS (SNP);

MASKS;

EID: 0035043060     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.410753     Document Type: Article

References (4)

1. Mask specifications and OPC
2. Control methodology of off-target for varying pattern densities with chrome dry etch
3. Impact of the loading effect on CD control in plasma etching of Cr photomasks using ZEP7000 resist