Challenge to 0.13 μm device patterning using KrF

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue II, 1999, Pages 872-881

  Kim, In Sung ^a   Lee, Jung Hyeon ^a   Cha, Dong Ho ^a   Park, Joon Soo ^a   Cho, Han Ku ^a   Moon, Joo Tae ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; EXCIMER LASERS; SCANNING;

RESOLUTION ENHANCEMENT TECHNIQUES (RET);

PHOTOLITHOGRAPHY;

EID: 0032652509     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.354405     Document Type: Conference Paper

References (5)