Application of PARAFAC2 to fault detection and diagnosis in semiconductor etch

Journal of Chemometrics

Volumn 15, Issue 4, 2001, Pages 285-298

  Berglund, Anders ^a   Kettaneh, Nouna ^b   Uppgård, Lise Lott ^a   Wold, Svante ^a   Bendwell, Nancy ^c   Cameron, Dave R ^c  

^a UMEÅ UNIVERSITY   (Sweden)

^b Umetrics Inc   (United States)

^c Tembec Inc   (Canada)

Author keywords

Batch process monitoring; Curve resolution; Multivariate statistical process control; Multiway

Indexed keywords

BATCH DATA PROCESSING; CHEMICAL DETECTION; MATRIX ALGEBRA; MULTIVARIANT ANALYSIS; PRINCIPAL COMPONENT ANALYSIS; PROCESS MONITORING; SEMICONDUCTOR DEVICE MANUFACTURE; STATISTICAL PROCESS CONTROL;

BATCH PROCESS MONITORING; CURVE RESOLUTION; FAULTS DETECTION; MATRIX; MULTIVARIATE STATISTICAL PROCESS CONTROL; MULTIWAY; PARAFAC; PARALLEL FACTOR ANALYSIS; PRINCIPAL-COMPONENT ANALYSIS; TIME AXIS;

FAULT DETECTION;

ANALYTIC METHOD; ARTICLE; DECOMPOSITION; MONITORING; PRINCIPAL COMPONENT ANALYSIS; SEMICONDUCTOR;

EID: 0035016232     PISSN: 08869383     EISSN: None     Source Type: Journal    
DOI: 10.1002/cem.689     Document Type: Article

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