A comparison of principal component analysis, multiway principal component analysis, trilinear decomposition and parallel factor analysis for fault detection in a semiconductor etch process

Journal of Chemometrics

Volumn 13, Issue 3-4, 1999, Pages 379-396

  Wise, Barry M ^a   Gallagher, Neal B ^a   Butler, Stephanie Watts ^b   White, Daniel D ^b   Barna, Gabriel G ^b  

^a EIGENVECTOR RESEARCH INC   (United States)

^b TEXAS INSTRUMENTS   (United States)

Author keywords

Fault detection; Measurement selection; Multivariate statistical process control; Multiway principal component analysis; Parallel factor analysis; Principal component analysis; Trilinear decomposition

Indexed keywords

BENCHMARKING; FACTOR ANALYSIS; FLOW OF GASES; MULTIVARIANT ANALYSIS; OPTICAL EMISSION SPECTROSCOPY; PRINCIPAL COMPONENT ANALYSIS; STATISTICAL PROCESS CONTROL;

ETCH PROCESS; FAULTS DETECTION; MEASUREMENT SELECTIONS; MULTIVARIATE STATISTICAL PROCESS CONTROL; MULTIWAY PRINCIPAL COMPONENT ANALYSIS; PARALLEL FACTOR ANALYSIS; PRINCIPAL-COMPONENT ANALYSIS; SENSOR SYSTEMS; SYSTEM FAULTS; TRILINEAR DECOMPOSITION;

FAULT DETECTION;

EID: 0001067412     PISSN: 08869383     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1099-128X(199905/08)13:3/4<379::AID-CEM556>3.0.CO;2-N     Document Type: Article

References (15)

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