PECVD films for low-temperature poly-Si TFT-LCD applications

Journal of the Society for Information Display

Volumn 9, Issue 1, 2001, Pages 57-60

  Takehara, T ^a   Harshbarger, W R ^a   Tsai, C C ^b   Toet, D ^c   Sigmon, T ^c  

^a M/s 9104   (United States)

^b Quanta Computer   (Taiwan)

^c Lawrence Llvermore National Laboratory   (United States)

Author keywords

Excimer lasers; Hydrogenated a Si; PECVD films; Poly Si TFTs

Indexed keywords

AMORPHOUS SILICON; CRYSTALLIZATION; EXCIMER LASERS; LIQUID CRYSTAL DISPLAYS; LOW TEMPERATURE EFFECTS; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON;

ACTIVE MATRIX LIQUID CRYSTAL DISPLAY; LOW TEMPERATURE POLYCRYSTALLINE SILICON;

THIN FILM TRANSISTORS;

EID: 0034993999     PISSN: 10710922     EISSN: None     Source Type: Journal    
DOI: 10.1889/1.1844663     Document Type: Article

References (10)