Submicrometer lithography by near-field optical microscopy

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4318, Issue , 2001, Pages 42-47

  Juodkazis, Saulius ^a,b   Arisawa, Y ^a   Matsuo, S ^a   Misawa, H ^a   Tomasiunas, R ^b   Vaitkus, J ^b  

^a UNIVERSITY OF TOKUSHIMA   (Japan)

^b VILNIUS UNIVERSITY   (Lithuania)

Author keywords

Al coated silica tapered tips; Lithography; Near field optical microscopy

Indexed keywords

ASPECT RATIO; LASER PULSES; NEAR FIELD SCANNING OPTICAL MICROSCOPY; OPTICAL FIBERS; OPTICAL RESOLVING POWER; OPTIMIZATION; SILICA; SOLID STATE LASERS; SPIN COATING; THIN FILMS;

SPIN-COATED RESIST FILMS;

PHOTOLITHOGRAPHY;

EID: 0034938103     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.417618     Document Type: Article

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