Preparation and properties of Al1-xTixN solid solution thin films by multiple cathode sputtering

Journal of the European Ceramic Society

Volumn 21, Issue 10-11, 2001, Pages 1573-1576

  Maiwa, Hiroshi ^a   Ichinose, Noboru ^b  

^a SHONAN INSTITUTE OF TECHNOLOGY   (Japan)

^b WASEDA UNIVERSITY   (Japan)

Author keywords

Films; Nitrides; Optical properties; Oxidation resistance; Spectroscopy

Indexed keywords

BINDING ENERGY; OXIDATION RESISTANCE; SOLID SOLUTIONS; SPUTTER DEPOSITION;

FILM SURFACE;

THIN FILMS;

CERAMICS;

EID: 0034890148     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0955-2219(01)00067-X     Document Type: Article

References (5)

1. xN solid solution
2. 0.5N films: Kinetics and mechanism
3. xN films
4. Lattice vibration spectra of aluminum nitride
5. Lattice vibration spectra of epitaxially grown films of AIN on silicon by reactive evaporation