Simulation of picosecond pulsed laser ablation of silicon: The molecular-dynamics thermal-annealing model

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4276, Issue , 2001, Pages 57-61

  Lorazo, P ^a   Lewis, L J ^a   Meunier, M ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

Laser ablation; Molecular dynamics; Silicon; Subsurface superheating effects; Thermal annealing model

Indexed keywords

ANNEALING; DIFFUSION; LASER ABLATION; MOLECULAR DYNAMICS; PHOTONS; PULSED LASER APPLICATIONS; SCATTERING;

PULSED LASER ABLATION; THERMAL CONFINEMENT;

SILICON;

EID: 0034874913     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.428006     Document Type: Conference Paper

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