Electric-dipole layer on Au(111) surfaces

Applied Physics A: Materials Science and Processing

Volumn 72, Issue 8, 2001, Pages

  Mizutani, W ^a,d   Ishida, T ^a,b,e   Choi, N ^c   Uchihashi, T ^c,f   Tokumoto, H ^a  

^a NATL INST FOR ADV INTERDISC RES   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c Angstrom Technology Partnership   (Japan)

^d ELECTROTECHNICAL LABORATORY   (Japan)

^e NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^f UNIVERSITY OF HYOGO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CARBON NANOTUBES; CURRENT VOLTAGE CHARACTERISTICS; ELECTROCHEMISTRY; ELECTRODES; ETCHING; EVAPORATION; MICA; PLATINUM; SCANNING TUNNELING MICROSCOPY; SURFACE STRUCTURE;

BARRIER HEIGHT; ELETRIC DIPOLE MOMENT;

GOLD;

EID: 0034850223     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390100675     Document Type: Article

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