Ablation of amorphous SiO2 using ArF excimer laser

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4347, Issue , 2001, Pages 169-176

  Awazu, K ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

ArF excimer laser; Defect lines; Four membered rings; Si3+ structure; Silica glass

Indexed keywords

ABSORPTION SPECTROSCOPY; AMORPHOUS MATERIALS; EXCIMER LASERS; IRRADIATION; LASER ABLATION; LIGHT ABSORPTION; PULSED LASER APPLICATIONS; RAMAN SPECTROSCOPY; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

OPTICAL ABSORPTION SPECTROSCOPY;

SILICA;

EID: 0034841638     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.425011     Document Type: Conference Paper

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