Development and investigation of high quality CaF2 used for 157 nm micro lithography

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4404, Issue , 2001, Pages 298-304

  Engel, A ^a   Knapp, K ^a   Aschke, L ^a   Morsen E ^a   Triebel, W ^a   Chojetzki, C ^a   Bruckner S ^a  

^a Schott Lithotec AG   (Germany)

Author keywords

157 nm lithography; Calcium fluoride; Homogeneity; Initial and induced absorption; Stress birefringence

Indexed keywords

ABSORPTION; BIREFRINGENCE; CALCIUM COMPOUNDS; OPTICAL DESIGN; SCANNING;

FULL FIELD SCANNER SYSTEMS; STRESS BIREFRINGENCE;

PHOTOLITHOGRAPHY;

EID: 0034839738     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.425218     Document Type: Article

References (3)

1. Multi-type surface and thin film characterization using light scattering, scanning force microscopy and white light interferometry
2. Light scattering of UV-optical components
3. 2 single crystals by irradiating with ArF excimer laser light