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Chemistry of Materials

Volumn 13, Issue 6, 2001, Pages 2186-2194

Application of polysilanes to LSI manufacturing processes - Their antireflective properties and etching selectivity toward resists

(11) Hayase, S a Nakano, Y a Yoshikawa, S a Ohta, H a Sato, Y a Shiobara, E a Miyoshi, S a Onishi, Y a Abe, M a Matsuyama, H a Ohiwa, Y a

a TOSHIBA CORPORATION (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIMETICONE;

ARTICLE; CHEMICAL STRUCTURE; EXCIMER LASER; PHYSICAL PARAMETERS; RADIATION EXPOSURE; REFLECTOMETRY; STRUCTURE ANALYSIS; ULTRAVIOLET RADIATION;

EID: 0034839534 PISSN: 08974756 EISSN: None Source Type: Journal
DOI: 10.1021/cm010099o Document Type: Article

Times cited : (6)

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