Structural and acoustic characterization of highly oriented piezoelectric AlN films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4405, Issue , 2001, Pages 64-72

  Caliendo, C ^a   Imperatori, P ^a   Verona, E ^a  

^a CNR Consiglio Nazionale delle Ricerche   (Italy)

Author keywords

AlN; Reactive sputtering; XRD

Indexed keywords

ALUMINUM NITRIDE; FILM GROWTH; PIEZOELECTRIC MATERIALS; SEMICONDUCTING FILMS; SPUTTERING; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

REACTIVE SPUTTERING TECHNIQUES;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0034839217     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.425239     Document Type: Conference Paper

References (9)

1. Optimization of the sputtering deposition parameters of highly oriented piezoelectric AlN films
2. Techniques to control residual stress in ZnO thin films
3. Postdeposition annealing of radio frequency magnetron sputtered ZnO films
4. Structural properties of AlN films grown on Si, Ru/Si and ZnO/Si substrates
5. Elastic constants and Young's modulus for texturized materials with cubic and hexagonal symmetries
6. Interactive PC software for SAW propagation in anisotropic multilayers