Application and cost analysis of scatterometry for integrated metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3743, Issue , 1999, Pages 25-32

  Benesch, N ^a   Schneider, C ^a   Pfitzner, L ^a   Ryssel, H ^a  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; COST EFFECTIVENESS; PROCESS CONTROL; PRODUCTION CONTROL; SCATTERING; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS;

BREAK EVEN ANALYSIS; CRITICAL DIMENSION CHARACTERIZATION; IN-LINE METROLOGY; INTEGRATED METROLOGY; SCATTEROMETRIC INTENSITY MEASUREMENT; SCATTEROMETRY;

OPTICAL VARIABLES MEASUREMENT;

EID: 0032632798     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.346929     Document Type: Conference Paper

References (16)