Preparation and properties of MnSi1.7 on Si(001)

Microelectronic Engineering

Volumn 55, Issue 1-4, 2001, Pages 227-232

  Teichert, S ^a   Sarkar, D K ^a   Schwendler, S ^a   Giesler, H ^a   Mogilatenko, A ^a   Falke, M ^a   Beddies, G ^a   Hinneberg, H J ^a  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; CRYSTAL ORIENTATION; FILM PREPARATION; MORPHOLOGY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING MANGANESE COMPOUNDS; SEMICONDUCTING SILICON; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

MANGANESE SILICIDES;

SEMICONDUCTING FILMS;

EID: 0034818595     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00452-4     Document Type: Article

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