Polysilicon thin-film solar cells: Influence of the deposition rate upon enhanced diffusion and on cell performance

Solid State Phenomena

Volumn 80-81, Issue , 2001, Pages 269-274

  Beaucarne, G ^a   Caymax, M ^a   Peytier, I ^a   Poortmans, J ^a  

^a IMEC   (Belgium)

Author keywords

Chemical vapor deposition (CVD); Deposition rate; Polycrystalline silicon; Preferential doping; Thin film solar cells

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; DIFFUSION; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; PERFORMANCE; PHOSPHORUS; REACTION KINETICS; SEMICONDUCTING FILMS; SHORT CIRCUIT CURRENTS; SILICON SOLAR CELLS;

DEPOSITION RATE; POLYSILICON THIN FILM SOLAR CELLS; RED RESPONSE; THIN FILM SOLAR CELLS;

POLYSILICON;

EID: 0034818061     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/ssp.80-81.269     Document Type: Conference Paper

References (10)