Single high-order transverse mode 850 nm VCSEL with micromachined surface relief

Conference on Lasers and Electro-Optics Europe - Technical Digest

Volumn , Issue , 2001, Pages 106-107

  Shinada, S ^a   Koyama, F ^a   Nishiyama, N ^a   Arai, M ^a   Iga, K ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE REFLECTION; ION BEAMS; MICROMACHINING; OPTICAL DATA STORAGE; OXIDATION; SEMICONDUCTING GALLIUM ARSENIDE;

VERTICAL CAVITY SURFACE EMITTING LASERS (VCSEL);

SEMICONDUCTOR LASERS;

EID: 0034806519     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/cleo.2001.947546     Document Type: Conference Paper

References (5)