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Volumn 371, Issue 4, 2001, Pages 407-412

Ultra-trace analytical monitoring of silicon wafer surfaces by capillary electrophoresis

Author keywords

[No Author keywords available]

Indexed keywords

BIOMATERIAL; SILICON DIOXIDE;

EID: 0034775631     PISSN: 16182642     EISSN: None     Source Type: Journal    
DOI: 10.1007/s002160101007     Document Type: Article
Times cited : (6)

References (15)
  • 2
    • 0002908558 scopus 로고    scopus 로고
    • Minimizing Organic Contamination in Wafer Manufacturing
    • Pfitzner L, Bügler J (eds) Organic Contamination Workshop, Fraunhofer IRB Verlag, Erlangen
    • Ehmann T, Fabry L., Wieser M., Kotz L, Pahlke S (2000) Minimizing Organic Contamination in Wafer Manufacturing. In: Pfitzner L, Bügler J (eds) Organic Contamination Workshop, SEMICON Europe 2000 Proceedings, Fraunhofer IRB Verlag, Erlangen, pp 168-188
    • (2000) SEMICON Europe 2000 Proceedings , pp. 168-188
    • Ehmann, T.1    Fabry, L.2    Wieser, M.3    Kotz, L.4    Pahlke, S.5
  • 4
    • 0027842583 scopus 로고
    • The Adhesion and the Protection of Metallic Impurities at the Interface of Si Wafer Surface with Anion Species
    • Higashi GS, Irene EA, Ohmi T (eds) Materials Research Society, Pittsburgh, PE
    • Aomi H, Derouin F, Ohmi T (1993) The Adhesion and the Protection of Metallic Impurities at the Interface of Si Wafer Surface with Anion Species. In: Higashi GS, Irene EA, Ohmi T (eds) Surface Chemical Cleaning and Passivation for Semiconductor Processing, Materials Research Society, Pittsburgh, PE, pp 333-337
    • (1993) Surface Chemical Cleaning and Passivation for Semiconductor Processing , pp. 333-337
    • Aomi, H.1    Derouin, F.2    Ohmi, T.3
  • 8
    • 0000788330 scopus 로고
    • Effect of Chlorine Contaminated Organic Solvent Photoresist Stripper on Post-Metal Etch Corrosion
    • Heyns M, Meuris M, Mertens P (eds) Acco Leuven, Amersfoort, Belgium
    • Philipossian A, Fadden J, Roe L, Kroche E (1994) Effect of Chlorine Contaminated Organic Solvent Photoresist Stripper on Post-Metal Etch Corrosion. In: Heyns M, Meuris M, Mertens P (eds) Proc Second Int Symp Ultra-Clean Processing of Silicon Surfaces, Acco Leuven, Amersfoort, Belgium, pp 339-343
    • (1994) Proc Second Int Symp Ultra-clean Processing of Silicon Surfaces , pp. 339-343
    • Philipossian, A.1    Fadden, J.2    Roe, L.3    Kroche, E.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.