Photomask metrology in the era of neolithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3236, Issue , 1997, Pages 284-292

  Potzick, James ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Aerial image; Emulation; Metrology; Microlithography; Neolithography; Paleolithography; Photomask; Simulation

Indexed keywords

AERIAL IMAGE; EMULATION; METROLOGY; MICROLITHOGRAPHY; NEOLITHOGRAPHY; PALEOLITHOGRAPHY; SIMULATION;

BAR CODES; DATA STORAGE EQUIPMENT; IMAGING TECHNIQUES; INTEGRATED CIRCUITS; LIFE CYCLE; MATHEMATICAL TRANSFORMATIONS; MEASUREMENTS; PHASE SHIFT; PHASE SHIFTERS; PHOTOMASKS; SPECIFICATIONS;

MASKS;

EID: 0000446163     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.284026     Document Type: Conference Paper

References (6)

1. J. Potzick, "Accuracy in Integrated Circuit Dimensional Measurements", Ch 3, Handbook of Critical Dimension Metrology and Process Control, Vol TR52, SPIE, Bellinhgam, Wash., pp 120-132 (Sept. 1993).
2. J. Potzick, "Antireflecting-Chromium Line-width Standard, SRM 473, for Calibration of Optical Microscope Linewidth Measuring Systems," NIST Special Publication SP-260-129 (1997).
3. F.D. Kalk, A. Vacca, P. Radcliff, "Energy and size effects in pinhole defect detection and printability," Proceedings BACUS/SPIE Symposium on Photomask Technology and Management, 2884-12 (1996).
4. J. Potzick, "Improved Photomask Metrology through Exposure Emulation", Proceedings of Photomask Japan '95: Symposium on Photomask and X-ray Mask Technology II, SPIE, vol. 2512-61, Bellingham, Wash. (April 1995)
5. R. Rudd, J. Staples, D. Dove, "New Tool for Phase-Shift Mask Evaluations: The Stepper Equivalent Aerial Image Measurement System-AIMS," Proc. SPIE, Vol. 2087 (1993).
6. International Vocabulary of Basic and General Terms in Metrology, 2nd Ed, ISO, Geneva (1993). [Available from Global Engineering Documents, 15 Inverness Way East, Engle-wood, Colo. 80112. 800-624-3974.]