Post-development defect evaluation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue , 2001, Pages 598-607

  Miyahara, O ^a   Kiba, Y ^a   Ono, Y ^a  

^a TOKYO ELECTRON LTD   (Japan)

Author keywords

AES; AFM; CA Resist; Defect; Satellite

Indexed keywords

CHEMICALLY AMPLIFIED RESISTS (CAR); ELEMENTAL ANALYSIS;

ANTIREFLECTION COATINGS; ATOMIC FORCE MICROSCOPY; DATA REDUCTION; EROSION; IMAGE ANALYSIS; SCANNING ELECTRON MICROSCOPY;

PHOTORESISTS;

EID: 0034758369     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436783     Document Type: Conference Paper

References (4)