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Volumn 122, Issue 38, 2000, Pages 9182-9188

Stereochemistry and pseudosymmetries in main chain polymeric free radicals

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLIC ACID DERIVATIVE; ESTER; FREE RADICAL; METHACRYLIC ACID DERIVATIVE; POLYMER; PROTON; SOLVENT;

EID: 0034721470     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja993381t     Document Type: Article
Times cited : (24)

References (41)
  • 4
    • 0040065241 scopus 로고
    • Applications of Radiation Sensitive Polymer Systems
    • Gould, R. F., Ed.; ACS Symp. Ser.; American Chemical Society: Washington, DC
    • Moreau, W.; Viswanathan, N. Applications of Radiation Sensitive Polymer Systems. In UV Light Induced Reactions in Polymers; Gould, R. F., Ed.; ACS Symp. Ser.; American Chemical Society: Washington, DC, 1976; p 125.
    • (1976) UV Light Induced Reactions in Polymers , pp. 125
    • Moreau, W.1    Viswanathan, N.2
  • 14
    • 0342732626 scopus 로고
    • Degradation of methacrylate copolymers with much more photo-chemically reactive poly(ketone) blocks have been reported: Kilp, T. G., Guillet, J. E.; Galin, J. C.; Roussel, R. Macromolecules 1982, 15, 980.
    • (1982) Macromolecules , vol.15 , pp. 980
    • Kilp, T.G.1    Guillet, J.E.2    Galin, J.C.3    Roussel, R.4
  • 27
    • 0343602585 scopus 로고    scopus 로고
    • note
    • -4 M.
  • 30
    • 0342297642 scopus 로고    scopus 로고
    • note
    • The phase of this polarization depends on the symmetry of the photoexcited triplet state energy levels, and this is a subject for future study.
  • 38
    • 0001851296 scopus 로고
    • Degradation of Poly(methyl methacrylate)
    • Clough, R. L., Shalaby, S. W., Eds.; American Chemical Society: Washington, DC
    • Moore, J. A.; Choi, J. O. Degradation of Poly(methyl methacrylate). In Radiation Effects on Polymers; Clough, R. L., Shalaby, S. W., Eds.; American Chemical Society: Washington, DC, 1991; p 156.
    • (1991) Radiation Effects on Polymers , pp. 156
    • Moore, J.A.1    Choi, J.O.2
  • 39
    • 0343602584 scopus 로고    scopus 로고
    • note
    • A very limited number of suitable TREPR solvents were found to dissolve PMMA. The poly(n-butyl methacrylate) spectra are presented here because more solvents were available.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.