Temperature programmed photoelectron emission analysis of copper surfaces subjected to cleaning and abrasion in organic liquids

Proceedings of the Second International Conference on Processing Materials for Properties

Volumn , Issue , 2000, Pages 285-290

  Momose, Yoshihiro ^a   Kohno, Suguru ^a   Honma, Masakazu ^a   Kamosawa, Tokirou ^a  

^a IBARAKI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABRASION; ALCOHOLS; GEIGER COUNTERS; ORGANIC SOLVENTS; OXYGEN; PHOTOEMISSION; TEMPERATURE; ULTRASONIC CLEANING; WATER; X RAY PHOTOELECTRON SPECTROSCOPY;

ACID-BASE INTERACTION; TEMPERATURE PROGRAMMED PHOTOELECTRON EMISSION ANALYSIS;

COPPER;

EID: 0034592613     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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